Resistless patterning of a chlorine monolayer on a Si(001) surface with an electron beam

被引：1

作者：

Jeon, C. ^{[2
,3
]}

Hwang, H-N. ^{[1
]}

Shin, H. -J. ^{[1
]}

Park, C. -Y. ^{[2
,3
,4
]}

Hwang, C. -C. ^{[1
]}

机构：

[1] Pohang Univ Sci & Technol POSTECH, Pohang Accelerator Lab PAL, Beamline Res Div, Pohang 790784, South Korea

[2] Sungkyunkwan Univ, Phys Res Div BK21, Suwon 440746, South Korea

[3] Sungkyunkwan Univ, Ctr Nanotube & Nanostruct Composites CNNC, Suwon 440746, South Korea

[4] Sungkyunkwan Univ, Dept Energy Sci, Suwon 440746, South Korea

来源：

APPLIED SURFACE SCIENCE | 2011年 / 257卷 / 21期

关键词：

Synchrotron radiation photoelectron spectroscopy; Electron stimulated desorption; Silicon; Chlorine; STIMULATED DESORPTION; HYDROGEN; LITHOGRAPHY; ADSORPTION; SI;

D O I：

10.1016/j.apsusc.2011.04.043

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We achieved electron beam (e-beam) patterning without a photoresist on a Cl-terminated Si(0 0 1) surface. Synchrotron radiation photoemission spectroscopy and scanning photoelectron microscopy were employed to investigate the surface chemical state and pattern formation. The Cl-Si bonds were easily broken by the irradiation with an e-beam of 1 keV, leading to a pattern formation through the adsorption of residual molecules of water and hydrocarbon at the exposed Si dangling bond sites. In addition, we demonstrated the selective adsorption of desired molecules on the surface by e-beam irradiation in environments consisting of different gases, such as oxygen, ammonia, and 1-butanethiol. (C) 2011 Elsevier B. V. All rights reserved.

引用

页码：8794 / 8797

页数：4

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