Growth of Cr-doped TiO2 films in the rutile and anatase structures by oxygen plasma assisted molecular beam epitaxy

被引:42
|
作者
Osterwalder, J
Droubay, T
Kaspar, T
Williams, J
Wang, CM
Chambers, SA
机构
[1] Univ Zurich, Inst Phys, CH-8057 Zurich, Switzerland
[2] Pacific NW Natl Lab, Fundamental Sci Div, Richland, WA 99352 USA
关键词
magnetic properties and measurements; molecular beam epitaxy; chromium; titanium dioxide;
D O I
10.1016/j.tsf.2005.02.028
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
As part of a search for new spintronic materials, highly ordered films of CrxTi1-xO2 in both the rutile and anatase structures and for several Cr concentrations ranging from x=0.02 to 0.16 were grown by oxygen plasma assisted molecular beam epitaxy. X-ray photoelectron diffiraction data of the Cr 2p level exhibit the same patterns and the same modulation amplitudes as those observed for Ti 2p, providing a strong indication that a large fraction of the Cr atoms occupy substitutional lattice sites in both structures. The Cr 2p core-level spectra as well as a Cr 3d related dopant signal above the valence band of TiO2 are characteristic of Cr3+ ions. At room temperature, Cr-doped anatase films exhibit ferromagnetic order with a saturation magnetization of similar to 0.6 mu B per Cr atom and strong in-plane anisotropy. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:289 / 298
页数:10
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