共 10 条
Surface roughening due to adsorbates
被引:2
作者:

De Micco, C
论文数: 0 引用数: 0
h-index: 0
机构: Univ Mar del Plata, INTEMA, Mar Del Plata, Argentina

Guidoni, SE
论文数: 0 引用数: 0
h-index: 0
机构: Univ Mar del Plata, INTEMA, Mar Del Plata, Argentina

Mirabella, DA
论文数: 0 引用数: 0
h-index: 0
机构: Univ Mar del Plata, INTEMA, Mar Del Plata, Argentina

Aldao, CM
论文数: 0 引用数: 0
h-index: 0
机构: Univ Mar del Plata, INTEMA, Mar Del Plata, Argentina
机构:
[1] Univ Mar del Plata, INTEMA, Mar Del Plata, Argentina
[2] CNR, CONICET, Mar Del Plata, Argentina
关键词:
Monte Carlo simulations;
surface roughening;
surface structure;
morphology;
roughness and topography;
D O I:
10.1016/j.molcata.2004.09.043
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
With a solid-on-solid model, we show how adsorbates can induce surface roughening. Roughened surfaces exhibit pits and regrowth structures that have characteristic patterns that depend directly on the adsorbate coverage and on the strength and type of involved interactions. Monte Carlo simulations were used to explore the consequences of adsorbate-adsorbate repulsion and two types of adsorbate-substrate interactions that lead to roughening, (C) 2004 Elsevier B.V. All rights reserved.
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页码:111 / 115
页数:5
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共 10 条
[1]
Monte Carlo modeling of Si(100) roughening due to adsorbate-adsorbate repulsion
[J].
Aldao, CM
;
Guidoni, SE
;
Xu, GJ
;
Nakayama, KS
;
Weaver, JH
.
SURFACE SCIENCE,
2004, 551 (1-2)
:143-149

Aldao, CM
论文数: 0 引用数: 0
h-index: 0
机构: Univ Illinois, Dept Mat Sci & Engn, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA

Guidoni, SE
论文数: 0 引用数: 0
h-index: 0
机构: Univ Illinois, Dept Mat Sci & Engn, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA

Xu, GJ
论文数: 0 引用数: 0
h-index: 0
机构: Univ Illinois, Dept Mat Sci & Engn, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA

Nakayama, KS
论文数: 0 引用数: 0
h-index: 0
机构: Univ Illinois, Dept Mat Sci & Engn, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA

Weaver, JH
论文数: 0 引用数: 0
h-index: 0
机构: Univ Illinois, Dept Mat Sci & Engn, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
[2]
Halogen etching of Si via atomic-scale processes
[J].
Aldao, CM
;
Weaver, JH
.
PROGRESS IN SURFACE SCIENCE,
2001, 68 (4-6)
:189-230

Aldao, CM
论文数: 0 引用数: 0
h-index: 0
机构: Univ Mar del Plata, Inst Mat Sci & Technol, CONICET, INTEMA, RA-7600 Mar Del Plata, Argentina

Weaver, JH
论文数: 0 引用数: 0
h-index: 0
机构: Univ Mar del Plata, Inst Mat Sci & Technol, CONICET, INTEMA, RA-7600 Mar Del Plata, Argentina
[3]
DETERMINATION OF DYNAMIC PARAMETERS CONTROLLING ATOMIC-SCALE ETCHING OF SI(100)-(2X1) BY CHLORINE
[J].
CHANDER, M
;
GOETSCH, DA
;
ALDAO, CM
;
WEAVER, JH
.
PHYSICAL REVIEW LETTERS,
1995, 74 (11)
:2014-2017

CHANDER, M
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV MAR DEL PLATA,CONSEJO NACL INVEST CIENT & TECN,INST MAT SCI & TECHNOL,RA-7600 MAR DEL PLATA,BUENOS AIRES,ARGENTINA UNIV MAR DEL PLATA,CONSEJO NACL INVEST CIENT & TECN,INST MAT SCI & TECHNOL,RA-7600 MAR DEL PLATA,BUENOS AIRES,ARGENTINA

GOETSCH, DA
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV MAR DEL PLATA,CONSEJO NACL INVEST CIENT & TECN,INST MAT SCI & TECHNOL,RA-7600 MAR DEL PLATA,BUENOS AIRES,ARGENTINA UNIV MAR DEL PLATA,CONSEJO NACL INVEST CIENT & TECN,INST MAT SCI & TECHNOL,RA-7600 MAR DEL PLATA,BUENOS AIRES,ARGENTINA

ALDAO, CM
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV MAR DEL PLATA,CONSEJO NACL INVEST CIENT & TECN,INST MAT SCI & TECHNOL,RA-7600 MAR DEL PLATA,BUENOS AIRES,ARGENTINA UNIV MAR DEL PLATA,CONSEJO NACL INVEST CIENT & TECN,INST MAT SCI & TECHNOL,RA-7600 MAR DEL PLATA,BUENOS AIRES,ARGENTINA

WEAVER, JH
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV MAR DEL PLATA,CONSEJO NACL INVEST CIENT & TECN,INST MAT SCI & TECHNOL,RA-7600 MAR DEL PLATA,BUENOS AIRES,ARGENTINA UNIV MAR DEL PLATA,CONSEJO NACL INVEST CIENT & TECN,INST MAT SCI & TECHNOL,RA-7600 MAR DEL PLATA,BUENOS AIRES,ARGENTINA
[4]
SURFACE RETEXTURING OF PT WIRES DURING THE CATALYTIC-OXIDATION OF CO
[J].
GALWEY, AK
;
GRAY, P
;
GRIFFITHS, JF
;
HASKO, SM
.
NATURE,
1985, 313 (6004)
:668-671

GALWEY, AK
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV LEEDS,SCH CHEM,LEEDS LS2 9JT,W YORKSHIRE,ENGLAND UNIV LEEDS,SCH CHEM,LEEDS LS2 9JT,W YORKSHIRE,ENGLAND

GRAY, P
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV LEEDS,SCH CHEM,LEEDS LS2 9JT,W YORKSHIRE,ENGLAND UNIV LEEDS,SCH CHEM,LEEDS LS2 9JT,W YORKSHIRE,ENGLAND

GRIFFITHS, JF
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV LEEDS,SCH CHEM,LEEDS LS2 9JT,W YORKSHIRE,ENGLAND UNIV LEEDS,SCH CHEM,LEEDS LS2 9JT,W YORKSHIRE,ENGLAND

HASKO, SM
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV LEEDS,SCH CHEM,LEEDS LS2 9JT,W YORKSHIRE,ENGLAND UNIV LEEDS,SCH CHEM,LEEDS LS2 9JT,W YORKSHIRE,ENGLAND
[5]
Spontaneous roughening: Fundamental limits in Si(100) halogen etch processing
[J].
Herrmann, CF
;
Chen, DX
;
Boland, JJ
.
PHYSICAL REVIEW LETTERS,
2002, 89 (09)

Herrmann, CF
论文数: 0 引用数: 0
h-index: 0
机构:
Univ N Carolina, Dept Chem, Venable & Kenan Labs, Chapel Hill, NC 27599 USA Univ N Carolina, Dept Chem, Venable & Kenan Labs, Chapel Hill, NC 27599 USA

Chen, DX
论文数: 0 引用数: 0
h-index: 0
机构:
Univ N Carolina, Dept Chem, Venable & Kenan Labs, Chapel Hill, NC 27599 USA Univ N Carolina, Dept Chem, Venable & Kenan Labs, Chapel Hill, NC 27599 USA

Boland, JJ
论文数: 0 引用数: 0
h-index: 0
机构:
Univ N Carolina, Dept Chem, Venable & Kenan Labs, Chapel Hill, NC 27599 USA Univ N Carolina, Dept Chem, Venable & Kenan Labs, Chapel Hill, NC 27599 USA
[6]
Halogen etching of Si(100)-2x1: Dependence on surface concentration
[J].
Nakayama, K
;
Aldao, CM
;
Weaver, JH
.
PHYSICAL REVIEW B,
1999, 59 (24)
:15893-15901

Nakayama, K
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Minnesota, Dept Mat Sci & Chem Engn, Minneapolis, MN 55455 USA Univ Minnesota, Dept Mat Sci & Chem Engn, Minneapolis, MN 55455 USA

Aldao, CM
论文数: 0 引用数: 0
h-index: 0
机构: Univ Minnesota, Dept Mat Sci & Chem Engn, Minneapolis, MN 55455 USA

Weaver, JH
论文数: 0 引用数: 0
h-index: 0
机构: Univ Minnesota, Dept Mat Sci & Chem Engn, Minneapolis, MN 55455 USA
[7]
Surface modification without desorption: Recycling of Cl on Si(100)-(2 x 1)
[J].
Nakayama, KS
;
Graugnard, E
;
Weaver, JH
.
PHYSICAL REVIEW LETTERS,
2002, 88 (12)
:4

Nakayama, KS
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA

Graugnard, E
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA

Weaver, JH
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA
[8]
Adsorption-induced step formation
[J].
Thostrup, P
;
Christoffersen, E
;
Lorensen, HT
;
Jacobsen, KW
;
Besenbacher, F
;
Norskov, JK
.
PHYSICAL REVIEW LETTERS,
2001, 87 (12)
:1-126102

Thostrup, P
论文数: 0 引用数: 0
h-index: 0
机构: Aarhus Univ, Inst Phys & Astron, CAMP, DK-8000 Aarhus, Denmark

Christoffersen, E
论文数: 0 引用数: 0
h-index: 0
机构: Aarhus Univ, Inst Phys & Astron, CAMP, DK-8000 Aarhus, Denmark

Lorensen, HT
论文数: 0 引用数: 0
h-index: 0
机构: Aarhus Univ, Inst Phys & Astron, CAMP, DK-8000 Aarhus, Denmark

Jacobsen, KW
论文数: 0 引用数: 0
h-index: 0
机构: Aarhus Univ, Inst Phys & Astron, CAMP, DK-8000 Aarhus, Denmark

Besenbacher, F
论文数: 0 引用数: 0
h-index: 0
机构:
Aarhus Univ, Inst Phys & Astron, CAMP, DK-8000 Aarhus, Denmark Aarhus Univ, Inst Phys & Astron, CAMP, DK-8000 Aarhus, Denmark

Norskov, JK
论文数: 0 引用数: 0
h-index: 0
机构: Aarhus Univ, Inst Phys & Astron, CAMP, DK-8000 Aarhus, Denmark
[9]
Energetics of Si(001)
[J].
Zandvliet, HJW
.
REVIEWS OF MODERN PHYSICS,
2000, 72 (02)
:593-602

Zandvliet, HJW
论文数: 0 引用数: 0
h-index: 0
机构: Univ Twente, Fac Appl Phys, NL-7500 AE Enschede, Netherlands
[10]
Effect of adsorption on surface roughening
[J].
Zhdanov, VP
;
Kasemo, B
.
PHYSICAL REVIEW B,
1997, 56 (16)
:10067-10070

Zhdanov, VP
论文数: 0 引用数: 0
h-index: 0
机构:
CHALMERS UNIV TECHNOL,DEPT APPL PHYS,S-41296 GOTHENBURG,SWEDEN RUSSIAN ACAD SCI,BORESKOV INST CATALYSIS,NOVOSIBIRSK 630090,RUSSIA

Kasemo, B
论文数: 0 引用数: 0
h-index: 0
机构: RUSSIAN ACAD SCI,BORESKOV INST CATALYSIS,NOVOSIBIRSK 630090,RUSSIA