Interferometric snapshot spectro-ellipsometry

被引：14
作者：
Dembele, Vamara [1 ]
Jin, Moonseob [1 ]
Choi, Inho [1 ]
Chegal, Won [2 ]
Kim, Daesuk [1 ]
机构：
[1] Chonbuk Natl Univ, Div Mech Syst Engn, Jeonju 54896, South Korea
[2] Korea Res Inst Stand & Sci, Adv Instrumentat Inst, Daejeon 34113, South Korea
来源：
OPTICS EXPRESS | 2018年 / 26卷 / 02期
基金：
新加坡国家研究基金会;
关键词：
MULTILAYER THIN-FILMS; SPECTRAL INTERFEROMETRY; ELECTRON-MICROSCOPY; CHANNELED SPECTRUM; THICKNESS-PROFILE; ELLIPSOMETRY;
D O I：
10.1364/OE.26.001333
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We propose a snapshot spectroscopic ellipsometry and its applications for realtime thin-film thickness measurement. The proposed system employs an interferometric polarization-modulation module that can measure the spectroscopic ellipsometric phase for thin-film deposited on a substrate with a measurement speed of around 20 msec. It requires neither moving parts nor time dependent modulation devices. The accuracy of the proposed interferometric snapshot spectro-ellipsometer is analyzed through comparison with commercial equipment results. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
引用
收藏
页码：1333 / 1341
页数：9
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