Holographic X-ray optical elements: transition between refraction and diffraction

被引：38
作者：
Snigireva, I
Snigirev, A
Rau, C
Weitkamp, T
Aristov, V
Grigoriev, M
Kuznetsov, S
Shabelnikov, L
Yunkin, V
Hoffmann, M
Voges, E
机构：
[1] European Synchrotron Radiat Facil, F-38043 Grenoble, France
[2] RAS, Inst Microelect Technol, Chernogolovka 142432, Russia
[3] Univ Dortmund, D-44227 Dortmund, Germany
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 2001年 / 467卷
关键词：
X-rays; focusing; lens; parabolic; microfabrication;
D O I：
10.1016/S0168-9002(01)00556-3
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Planar microelectronics technology involving photolithography and highly anisotropic plasma etching techniques, was applied to fabricate refractive and diffractive (kinoform) lenses. Focusing properties in terms of focus spot and efficiency in the energy range 8-25 keV for both types of lenses were tested at the European Synchrotron Radiation Facility (ESRF) ID22 beamline. Focal spot of 1.5 mum with a gain of 25 was measured at 15keV. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：982 / 985
页数：4
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