Laser Produced Plasma Light Source for EUVL

被引：10

作者：

Fomenkov, Igor V. ^{[1
]}

Ershov, Alex I. ^{[1
]}

Partlo, William N. ^{[1
]}

Myers, David W. ^{[1
]}

Brown, Daniel ^{[1
]}

Sandstrom, Richard L. ^{[1
]}

La Fontaine, Bruno ^{[1
]}

Bykanov, Alexander N. ^{[1
]}

Vaschenko, Georgiy O. ^{[1
]}

Khodykin, Oleh V. ^{[1
]}

Boewering, Norbert R. ^{[1
]}

Das, Palash ^{[1
]}

Fleurov, Vladimir B. ^{[1
]}

Zhang, Kevin ^{[1
]}

Srivastava, Shailendra N. ^{[1
]}

Ahmad, Imtiaz ^{[1
]}

Rajyaguru, Chirag ^{[1
]}

De Dea, Silvia ^{[1
]}

Hou, Richard R. ^{[1
]}

Dunstan, Wayne J. ^{[1
]}

Baumgart, Peter ^{[1
]}

Ishihara, Toshi ^{[1
]}

Simmons, Rod D. ^{[1
]}

Jacques, Robert N. ^{[1
]}

Bergstedt, Robert A. ^{[1
]}

Brandt, David C. ^{[1
]}

机构：

[1] Cymer Inc, San Diego, CA 92127 USA

来源：

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY II | 2011年 / 7969卷

关键词：

EUV source; EUV lithography; Laser Produced Plasma;

D O I：

10.1117/12.882210

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

This paper describes the development of laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source architecture for advanced lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193 nm immersion technology for sub-22 nm critical layer patterning. In this paper we discuss the most recent results from high qualification testing of sources in production. Subsystem performance will be shown including collector protection, out-of-band (OOB) radiation measurements, and intermediate-focus (IF) protection as well as experience in system use. This presentation reviews the experimental results obtained on systems with a focus on the topics most critical for an HVM source.

引用

页数：6

共 7 条

[1] [Anonymous], P SPIE
[2] Performance results of laser-produced plasma test and prototype light sources for EUV lithography
Boewering, Norbert R.
Fomenkov, Igor V.
Brandt, David C.
Bykanov, Alexander N.
Ershov, Alex I.
Partlo, William N.
Myers, David W.
Farrar, Nigel R.
Vaschenko, Georgiy O.
Khodykin, Oleh V.
Hoffman, Jerzy R.
Chrobak, Christopher P.
Srivastava, Shailendra N.
Ahmad, Imtiaz
Rajyaguru, Chirag
Golich, Daniel
Vidusek, David A.
De Dea, Silvia
Hou, Richard R.
[J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2009, 8 (04):
[3] EUV source collector
Bowering, Norbert R.
Ershov, Alex I.
Marx, William F.
Khodykin, Oleh V.
Hansson, Bjorn A. M.
Vargas L., Ernesto
Chavez, Juan A.
Fomenkov, Igor V.
Myers, David W.
Brandt, David C.
[J]. EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2, 2006, 6151
[4] Brandt D. C, 2011, P SPIE, V7969
[5] LPP Source System Development for HVM
Brandt, David C.
Fomenkov, Igor V.
Ershov, Alex I.
Partlo, William N.
Myers, David W.
Boewering, Norbert R.
Farrar, Nigel R.
Vaschenko, Georgiy O.
Khodykin, Oleh V.
Bykanov, Alexander N.
Hoffman, Jerzy R.
Chrobak, Christopher P.
Srivastava, Shailendra N.
Ahmad, Imtiaz
Rajyaguru, Chirag
Golich, Daniel J.
Vidusek, David A.
De Dea, Silvia
Hou, Richard R.
[J]. ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES, 2009, 7271
[6] Laser-Produced Plasma Light Source for EUVL
Fomenkov, Igor V.
Brandt, David C.
Bykanov, Alexander N.
Ershov, Alex I.
Partlo, William N.
Myers, David W.
Boewering, Norbert R.
Farrar, Nigel R.
Vaschenko, Georgiy O.
Khodykin, Oleh V.
Hoffman, Jerzy R.
Chrobak, Christopher P.
Srivastava, Shailendra N.
Golich, Daniel J.
Vidusek, David A.
De Dea, Silvia
Hou, Richard R.
[J]. ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES, 2009, 7271
[7] Laser-produced plasma source system development
Fomenkov, Igor V.
Brandt, David C.
Bykanov, Alexander N.
Ershov, Alex I.
Partlo, William N.
Myers, David W.
Bbwering, Norbert R.
Vaschenko, Georgiy O.
Khodykin, Oleh V.
Hoffman, Jerzy R.
Vargas, Ernesto
Simmons, Rodney D.
Chavez, Juan A.
Chrobak, Christopher P.
[J]. EMERGING LITHOGRAPHIC TECHNOLOGIES XI, PTS 1 AND 2, 2007, 6517

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