Effects of the electron-hole pair in Auger and X-ray photoemission spectroscopy from surfaces of Fe-Si

被引:0
|
作者
Gervasoni, J. L. [1 ,2 ]
Jenko, M. [3 ]
Poniku, B. [3 ]
Belic, I. [3 ]
Juan, A. [4 ]
机构
[1] Univ Nacl Cuyo, Comis Nacl Energia Atom, Ctr Atom Bariloche, San Carlos De Bariloche, Rio Negro, Argentina
[2] Univ Nacl Cuyo, Comis Nacl Energia Atom, Inst Balseiro, San Carlos De Bariloche, Rio Negro, Argentina
[3] Inst Met & Technol, Ljubljana 1000, Slovenia
[4] Univ Nacl Sur, Dept Fis, RA-8000 Bahia Blanca, Buenos Aires, Argentina
来源
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2015年 / 354卷
关键词
Fe-Si; XPS-spectroscopy; Auger spectroscopy; Photoelectron; PLASMON EXCITATIONS; ENERGY-LOSS; EMISSION;
D O I
10.1016/j.nimb.2015.01.022
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
In this work, we investigate in detail the effects due to the interaction between an electron and a stationary positive ion (or atomic hole) in the neighborhood of a surface of Fe-Si, having a strong plasmon peak in their electron energy loss spectra, when it is excited with synchrotron radiation. We take into account the effects due to the sudden creation of an electron and the residual holes, one in the case of X-ray photoemission spectrostopy (XPS) and two in the case of Auger electron spectroscopy (AES). We use a semi classical dielectric formulation for the photoelectron trajectory, and we estimated the parameter r(s), the radius of the sphere occupied by one electron in the solid, which is critical in order to define the electron density of the alloy. With the cited formulation, we have obtained a detailed behavior of the different contributions of the collective excitations in both processes. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:313 / 316
页数:4
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