Generation of long and high-density plasma column using metal-antenna surface wave-excited plasma source

被引：11
作者：
Kousaka, H [1 ]
Xu, JQ
Umehara, N
机构：
[1] Nagoya Univ, Grad Sch Engn, Dept Mech Sci & Engn, Chikusa Ku, Nagoya, Aichi 4640814, Japan
[2] Xian Inst Technol, Xian 710032, Peoples R China
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2005年 / 44卷 / 33-36期
关键词：
microwave; surface wave; metal antenna; high-density plasma; plasma column; plasma source;
D O I：
10.1143/JJAP.44.L1052
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We investigated the effect of gas pressure on the length of a microwave-excited high-density plasma column sustained along a graphite rod (25 cm in length and 1.0cm in diameter), which was negatively biased against a grounded chamber. It was confirmed that the length of the overdense (> 10(11) cm(-3)) plasma column increased with increasing gas pressure and negative voltage. At a gas pressure of 33 Pa, we obtained the longest plasma column covering the entire surface of the rod with a negative voltage of -150V and an input microwave power of 100W.
引用
收藏
页码：L1052 / L1055
页数：4
相关论文
共 41 条
  • [21] Stable surface-wave plasma through excitation of standing surface wave using plane multislot antenna
    Suzuki, N
    Kitagawa, H
    Uchiyama, S
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (6A): : 3930 - 3935
  • [22] Fabrication of suspended membranes for thermal sensors using high-density plasma etching
    Tserepi, A
    Tsamis, C
    Gogolides, E
    Nassiopoulou, AG
    [J]. DESIGN, TEST, INTEGRATION, AND PACKAGING OF MEMS/MOEMS 2002, 2002, 4755 : 776 - 783
  • [23] Prototype of a 2.45 GHz cylindrical ceramic dielectric antenna surface wave plasma source for flood gun
    Peng, Shixiang
    Cui, Bujian
    Jiang, Yaoxiang
    Ma, Tenghao
    Wu, Wenbin
    Guo, Zhiyu
    Chen, Jiaer
    [J]. VACUUM, 2024, 226
  • [24] Novel high-density microwave plasma utilizing an internal spoke antenna for fast deposition of microcrystalline silicon films
    Shirai, H
    Yoshino, K
    Ohkawara, G
    Ueyama, H
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2001, 40 (7A): : L701 - L704
  • [25] In-situ method of monitoring argon plasma density variation using current and voltage of flat antenna in inductively coupled plasma source
    Lee, S. -H.
    Cho, J. -H.
    Kim, G. -H.
    [J]. CONTRIBUTIONS TO PLASMA PHYSICS, 2006, 46 (5-6) : 399 - 405
  • [26] High Power Microwave Generation using Dielectric Cherenkov Maser with Dielectric Rod and Plasma Column
    Roknuzzaman, K. M.
    Ali, Md Ershad
    [J]. 2014 INTERNATIONAL CONFERENCE ON INFORMATICS, ELECTRONICS & VISION (ICIEV), 2014,
  • [27] Fast deposition of microcrystalline silicon using high-density SiH4 microwave plasma
    Shirai, H
    Sakuma, Y
    Moriya, Y
    Fukai, C
    Ueyama, H
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1999, 38 (12A): : 6629 - 6635
  • [28] Synthesis of well-aligned carbon nanotubes using a high-density RF inductive coupling plasma
    Shirai, H
    Kikuchi, T
    Kobayashi, T
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (4A): : 1951 - 1954
  • [29] Packaging barrier films deposited on PET by PECVD using a new high density plasma source
    Madocks, J
    Rewhinkle, J
    Barton, L
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2005, 119 (03): : 268 - 273
  • [30] Formation of carbon nitride films by reactive high-density plasma sputtering with excitation of m=0 mode helicon wave
    Miyake, S
    Setsuhara, Y
    Shibata, K
    Kumagai, M
    Sakawa, Y
    Shoji, T
    [J]. SURFACE & COATINGS TECHNOLOGY, 1999, 116 : 11 - 17
12345