Special issue: Photoablation of materials - Preface

被引：0

|

作者：

Masuhara, H

Allen, N

机构：

[1] Osaka Univ, Dept Appl Phys, Fac Engn, Suita, Osaka 5650871, Japan

[2] Manchester Metropolitan Univ, John Dalton Fac Technol, Dept Chem, Manchester M1 5GD, Lancs, England

来源：

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY | 2001年 / 145卷 / 03期

关键词：

D O I：

10.1016/S1010-6030(01)00592-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：143 / 143

页数：1

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