Debris generation from CO2 and Nd:YAG laser-produced tin plasmas for EUV light source

被引：0
|
作者：
Nakamura, D. [1 ]
Tamaru, K. [1 ]
Akiyama, T. [1 ]
Takahashi, A. [2 ]
Okada, T. [1 ]
机构：
[1] Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, 744 Motooka, Fukuoka 8190395, Japan
[2] Kyushu Univ, Grad Sch Med, Higashi Ku, Fukuoka 8128582, Japan
来源：
PHOTON PROCESSING IN MICROELECTRONICS AND PHOTONICS VII | 2008年 / 6879卷
基金：
日本学术振兴会;
关键词：
extreme ultraviolet; laser-produced plasma; debris; fast ions; droplet;
D O I：
10.1117/12.767894
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The results of a comparative investigation on the emission characteristics of debris from CO2 laser-produced tin plasma and Nd: YAG laser-produced tin plasma for an extreme ultraviolet lithography (EUV) light source. The tin ions and droplets emitted from tin plasma produced by a CO2 laser or an Nd: YAG laser were detected with Faraday cups and quartz crystal micro-balance (QCM) detectors, respectively. The large size of droplets was also observed by silicon substrates as witness plates. A higher ion kinetic energy and lower debris emission in the case of CO2 laser in compared with Nd: YAG laser for the same laser energy of similar to 50 mJ. In addition, the dynamics of the neutral atoms and the irradiated target from an Nd:YAG laser-produced tin plasma with a mass-limited micro-droplet target were investigated by imaging techniques.
引用
收藏
页数：9
相关论文
共 50 条
  • [21] Development of EUV light source by laser-produced plasma
    Izawa, Y.
    Miyanaga, N.
    Nishimura, H.
    Fujioka, S.
    Aota, T.
    Tao, Y.
    Uchida, S.
    Shimada, Y.
    Hashimoto, K.
    Yamaura, M.
    Nishihara, K.
    Murakami, M.
    Sunahara, A.
    Furukawa, H.
    Sasaki, A.
    Nishikawa, W.
    Tanuma, H.
    Norimatsu, T.
    Nagai, K.
    Gu, Q.
    Nakatsuka, M.
    Fujita, H.
    Tsubakimoto, K.
    Yoshida, H.
    Mima, K.
    JOURNAL DE PHYSIQUE IV, 2006, 133 : 1161 - 1165
  • [22] Modeling of EUV emission and conversion efficiency from laser-produced tin plasmas for nanolithography
    Harilal, S. S.
    MacFarlane, J. J.
    Golovkin, I. E.
    Woodruff, P. R.
    Wang, P.
    EMERGING LITHOGRAPHIC TECHNOLOGIES XII, PTS 1 AND 2, 2008, 6921
  • [23] Conversion efficiency calculations for EUV radiation emitted from laser-produced Tin plasmas
    Atalay, Betul
    Kenar, Necla
    Demir, Arif
    TURKISH JOURNAL OF PHYSICS, 2009, 33 (06): : 363 - 368
  • [24] EUV Spectra from Laser-Produced Tungsten Plasmas
    Ohashi, Hayato
    Kawasaki, Hiromu
    Shimada, Yuta
    Namba, Shinichi
    O'sullivan, Gerry
    Higashiguchi, Takeshi
    PLASMA AND FUSION RESEARCH, 2025, 20
  • [25] Properties of ion debris emitted from laser-produced mass-limited tin plasmas for extreme ultraviolet light source applications
    Fujioka, S
    Nishimura, H
    Nishihara, K
    Murakami, M
    Kang, YG
    Gu, Q
    Nagai, K
    Norimatsu, T
    Miyanaga, N
    Izawa, Y
    Mima, K
    Shimada, Y
    Sunahara, A
    Furukawa, H
    APPLIED PHYSICS LETTERS, 2005, 87 (24) : 1 - 3
  • [26] Analysis, simulation, and experimental studies of YAG and CO2 laser-produced plasma for EUV lithography sources
    Hassanein, A.
    Sizyuk, V.
    Harilal, S. S.
    Sizyuk, T.
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY, 2010, 7636
  • [27] Optimum laser pulse duration for efficient extreme ultraviolet light generation from laser-produced tin plasmas
    Ando, Tsuyoshi
    Fujioka, Shinsuke
    Nishimura, Hiroaki
    Ueda, Nobuyoshi
    Yasuda, Yuzuri
    Nagai, Keiji
    Norimatsu, Takayoshi
    Murakami, Masakatsu
    Nishihara, Katsunobu
    Miyanaga, Noriaki
    Izawa, Yasukazu
    Mima, Kunioki
    Sunahara, Atsushi
    APPLIED PHYSICS LETTERS, 2006, 89 (15)
  • [28] Development of EUV light source by CO2 laser-produced plasma with nano-structured SnO2 targets
    Tanaka, H. (tanaka@laserlab.ees.kyushu-u.ac.jp), SPIE (SPIE):
  • [29] Development of EUV light source by CO2 laser-produced plasma with nano-structured SnO2 targets
    Tanaka, H
    Akinaga, K
    Takahashi, A
    Okada, T
    FIFTH INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2004, 5662 : 313 - 318
  • [30] Simulation of EUV spectral emission from laser-produced tin-doped water plasmas
    Woodruff, Pamela R.
    MacFarlane, Joseph J.
    Golovkin, Igor E.
    Wang, Ping
    EMERGING LITHOGRAPHIC TECHNOLOGIES XI, PTS 1 AND 2, 2007, 6517
12345