Deposition of thin conducting films of CuI on glass

被引:109
|
作者
Tennakone, K [1 ]
Kumara, GRRA [1 ]
Kottegoda, IRM [1 ]
Perera, VPS [1 ]
Aponsu, GMLP [1 ]
Wijayantha, KGU [1 ]
机构
[1] Inst Fundamental Studies, Kandy, Sri Lanka
关键词
thin conducting films; CuI; glass deposition;
D O I
10.1016/S0927-0248(98)00117-2
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
A method is described for coating thin optically transparent conducting films of CuI (p-type semiconductor of band gap similar to 3.1 eV) on glass. The dependence of the sheet resistance of the film on the level of iodine doping and other characteristics of the film are described. A minimum sheet resistance 25 Ohm/square (for a film of thickness similar to 10 mu m) was obtained through an optimization of iodine doping, sintering time and temperature. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:283 / 289
页数:7
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