Interpretation of azimuthal angle dependence of periodic gratings in Mueller matrix spectroscopic ellipsometry

被引:7
|
作者
Heinrich, Anett [1 ]
Bischoff, Joerg [2 ]
Meiner, Kurt [3 ]
Richter, Uwe [3 ]
Mikolajick, Thomas [1 ,4 ]
Dirnstorfer, Ingo [1 ]
机构
[1] NaMLab gGmbH, D-01187 Dresden, Germany
[2] Osires, D-98693 Ilmenau, Germany
[3] SENTECH Instruments GmbH, D-12489 Berlin, Germany
[4] Tech Univ Dresden, Inst Semicond & Microsyst, D-01187 Dresden, Germany
关键词
CRITICAL DIMENSION; DIFFRACTION;
D O I
10.1364/JOSAA.32.000604
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Mueller matrix spectroscopic ellipsometry becomes increasingly important for determining structural parameters of periodic line gratings. Because of the anisotropic character of gratings, the measured Mueller matrix elements are highly azimuthal angle dependent. Measurement results are interpreted by basic principles of diffraction on gratings. The spectral and azimuthal angle dependent intensity changes are correlated to so-called Rayleigh singularities, i.e., wavelengths where the number of diffraction orders changes. The positions of the Rayleigh singularities are calculated analytically and overlapped with measured spectra of two different types of photomasks with transparent and reflecting substrates. For both types of gratings, the Rayleigh singularities reproduce the contours of the spectra. Increasing grating periods result in a shift of these contours to longer wavelengths. Characteristic differences between the two photomasks are explained by the influence of the transmission orders, which are determined by the substrate transparency. (C) 2015 Optical Society of America
引用
收藏
页码:604 / 610
页数:7
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