共 22 条
[1]
[Anonymous], EUV DUV SCATTEROMETR
[2]
[Anonymous], P SPIE
[3]
[Anonymous], J MICRONANOLITHOGR M
[4]
[Anonymous], P SPIE
[5]
[Anonymous], 2013, P SPIE
[7]
Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry
[J].
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS,
2013, 12 (03)
[8]
An investigation of the effects of charging in SEM based CD metrology
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XI,
1997, 3050
:226-242
[10]
Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXV, PT 1 AND PT 2,
2011, 7971