Multibeam scanning electron microscope: Experimental results

被引:19
作者
Mohammadi-Gheidari, A. [1 ]
Hagen, C. W. [1 ]
Kruit, P. [1 ]
机构
[1] Delft Univ Technol, NL-2628 CJ Delft, Netherlands
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2010年 / 28卷 / 06期
关键词
FIELD-EMISSION PHOTOCATHODE; BEAM LITHOGRAPHY; EMITTER ARRAYS; FABRICATION; SYSTEM; COLUMN; SCHOTTKY;
D O I
10.1116/1.3498749
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The authors present the first results obtained with their multibeam scanning electron microscope. For the first time, they were able to image 196 (array of 14 X 14) focused beams of a multielectron beam source on a specimen using single beam scanning electron microscope (SEM) optics. The system consists of an FEI Novanano 200 SEM optics column equipped with a multielectron beam source module. The source module consists of the multibeam source and an accelerator lens. In the multibeam source, the wide angle beam of a high brightness Schottky source is divided into 196 beamlets and focused by an aperture lens array. The accelerator lens is positioned on the image plane of the multibeam source to direct the beams toward the SEM column. The array of source images is further imaged by the SEM magnetic lenses, and the beam opening angle is defined at the variable aperture of the SEM. The system is designed to deliver 14 X 14 arrays of beamlets with a minimum probe size of 1 nm. In this article, the performance of the system is examined for a fixed magnification case. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3498749]
引用
收藏
页码:C6G5 / C6G10
页数:6
相关论文
共 28 条
[1]  
Bronsgeest M.S., 2009, THESIS DELFT U TECHN
[2]   Multiple electron-beam lithography [J].
Chang, THP ;
Mankos, M ;
Lee, KY ;
Muray, LP .
MICROELECTRONIC ENGINEERING, 2001, 57-8 :117-135
[3]   Progress toward a raster multibeam lithography tool [J].
Coyle, ST ;
Shamoun, B ;
Yu, M ;
Maldonado, J ;
Thomas, T ;
Holmgren, D ;
Chen, X ;
Scheinfein, MR ;
DeVore, B ;
Gesley, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (02) :501-505
[4]   Brightness measurements of a ZrO W Schottky electron emitter in a transmission electron microscope [J].
Fransen, MJ ;
Overwijk, MHF ;
Kruit, P .
APPLIED SURFACE SCIENCE, 1999, 146 (1-4) :357-362
[5]  
Gheidari A. Mohammadi, 2010, P CPO 8 C SING UNPUB
[6]   High-dose exposure of silicon in electron beam lithography [J].
Grigorescu, Anda E. ;
van der Krogt, Marco C. ;
van der Drift, Emile W. J. M. ;
Hagen, Cornelis W. .
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2008, 7 (01)
[7]   Use of microfabricated cold field emitters in sub-100 nm maskless lithography [J].
Gu, GX ;
Tokunaga, K ;
Yin, E ;
Tsai, FC ;
Brodie, AD ;
Parker, NW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (03) :862-865
[8]   Fabrication of integrated micromachined electron guns [J].
Hofmann, W ;
Chen, LY ;
MacDonald, NC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06) :2701-2704
[9]   Photoemission from gold thin films for application in multiphotocathode arrays for electron beam lithography [J].
Jiang, XR ;
Berglund, CN ;
Bell, AE ;
Mackie, WA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06) :3374-3379
[10]   Optical properties of a multibeam column with a single-electron source [J].
Kamimura, Osamu ;
Tanimoto, Sayaka ;
Ohta, Hiroya ;
Nakayama, Yoshinori ;
Sakakibara, Makoto ;
Sohda, Yasunari ;
Muraki, Masato ;
Gotoh, Susumu ;
Hosoda, Masaki ;
Someda, Yasuhiro ;
Tamamori, Kenji ;
Hirose, Futoshi ;
Nagae, Kenichi ;
Kato, Kazuhiko ;
Okunuki, Masahiko .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (01) :140-146