Nucleation and growth process of atomic layer deposition platinum nanoparticles on strontium titanate nanocuboids

被引:15
作者
Wang, Chuandao [1 ,2 ]
Hu, Linhua [2 ]
Poeppelmeier, Kenneth [2 ,3 ]
Stair, Peter C. [2 ,3 ]
Marks, Laurence [1 ]
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, 2220 North Campus Dr, Evanston, IL 60208 USA
[2] Northwestern Univ, Dept Chem, 2145 Sheridan Rd, Evanston, IL 60208 USA
[3] Argonne Natl Lab, Chem Sci & Engn Div, 9700 South Cass Ave, Argonne, IL 60439 USA
关键词
atomic layer deposition; nucleation; growth; TEM; GAS SHIFT REACTION; OXIDE SUPPORTS; FILM GROWTH; IN-SITU; CATALYSTS; PHASE; DEHYDROGENATION; MORPHOLOGY; HYDROGEN; SILICA;
D O I
10.1088/1361-6528/aa688d
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Uniform, well-dispersed platinum nanoparticles were grown on SrTiO3 nanocuboids via atomic layer deposition (ALD) using (methylcyclopentadienyl) trimethylplatinum (MeCpPt(Me)(3)) and water. For the first half-cycle of the deposition particles formed through two sequential processes: initial nucleation and growth. The final particle size after a single complete ALD cycle was dependent on the reaction temperature which alters the net Pt deposition per cycle. Additional cycles resulted in further growth of previously formed particles. However, the increase in size per cycle during additional ALD cycles, beyond the first, was significantly lower as less Pt was deposited due to carbonaceous material that partially covers the surface and prevents further MeCpPt(Me)(3) adsorption and reaction. The increase in particle size was also temperature dependent due to changes in the net Pt deposition. Pt nanoparticles increased in size by 59% and 76% after 15 ALD cycles for reaction temperatures of 200 degrees C and 300 degrees C, respectively. There was minimal change in the number of particles per unit area as a function of reaction time, indicating that there was minimal Ostwald ripening or secondary nucleation for the reaction conditions.
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页数:8
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