Neural network modeling of growth processes

被引：0

作者：

Venkateswaran, S ^{[1
]}

Rai, MM ^{[1
]}

Govindan, TR ^{[1
]}

Meyyappan, M ^{[1
]}

机构：

[1] NASA, Ames Res Ctr, Moffett Field, CA 94035 USA

来源：

PHYSICS AND SIMULATION OF OPTOELECTRONIC DEVICES VIII, PTS 1 AND 2 | 2000年 / 3944卷

关键词：

neural network; process control; modeling; deposition;

D O I：

10.1117/12.391447

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Process control based on first-principles models is possible if the information from the reactor simulations can be represented in a compact model. This is necessary since on-demand reactor simulation in real time for control purposes is not currently realistic. We have developed a neural network based model for applications in process control and process design.

引用

页码：435 / 442

页数：8

共 9 条

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