FT-IR analysis of vapor adsorption onto TiO2 and SiO2 nanoparticle thin films.

被引：0
|
作者：
Spurlin, TA [1 ]
Evans, CR [1 ]
Frey, BL [1 ]
机构：
[1] Lake Forest Coll, Dept Chem, Lake Forest, IL 60045 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2001年 / 222卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
170-CHED
引用
收藏
页码：U220 / U220
页数：1
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