MONTE CARLO METHODS

被引:0
作者
Kalos, M. H. [1 ]
机构
[1] Lawrence Livermore Natl Lab, Livermore, CA 94551 USA
来源
EDWARD TELLER CENTENNIAL SYMPOSIUM: MODERN PHYSICS AND THE SCIENTIFIC LEGACY OF EDWARD TELLER | 2010年
关键词
GROUND-STATE; SIMULATIONS;
D O I
10.1142/9789812838001_0008
中图分类号
N09 [自然科学史]; B [哲学、宗教];
学科分类号
01 ; 0101 ; 010108 ; 060207 ; 060305 ; 0712 ;
摘要
Computation now plays an essential role in science, especially in theoretical physics. The greater depth of our understanding of physical phenomena and the need to predict the behavior of complex devices demands a level of analysis that purely mathematical methods cannot meet. Monte Carlo methods offer some of the most powerful approaches to computation. They permit a simple transcription of a random process into a computer code. Alternatively, they give the only accurate approach to the many-dimensional problems of theoretical physics. I will describe a number of complementary approaches for Monte Carlo methods in treating diverse systems.
引用
收藏
页码:128 / 139
页数:12
相关论文
共 29 条
[1]   QUANTUM CHEMISTRY BY RANDOM-WALK - H2P,H+3D3H1A'1,H-23-SIGMA+U,H-41-SIGMA+G,BE1S [J].
ANDERSON, JB .
JOURNAL OF CHEMICAL PHYSICS, 1976, 65 (10) :4121-4127
[2]  
[Anonymous], AIP C P
[3]  
[Anonymous], THEORIES STRONG WEAK
[4]  
Bird G., 1994, MOL GAS DYNAMICS DIR
[5]   NEW ALGORITHM FOR MONTE-CARLO SIMULATION OF ISING SPIN SYSTEMS [J].
BORTZ, AB ;
KALOS, MH ;
LEBOWITZ, JL .
JOURNAL OF COMPUTATIONAL PHYSICS, 1975, 17 (01) :10-18
[6]   Kinetic Monte Carlo simulations applied to irradiated materials: The effect of cascade damage in defect nucleation and growth [J].
Caturla, M. J. ;
Soneda, N. ;
de la Rubia, T. Diaz ;
Fluss, M. .
JOURNAL OF NUCLEAR MATERIALS, 2006, 351 (1-3) :78-87
[7]   GROUND-STATE OF THE ELECTRON-GAS BY A STOCHASTIC METHOD [J].
CEPERLEY, DM ;
ALDER, BJ .
PHYSICAL REVIEW LETTERS, 1980, 45 (07) :566-569
[8]   SIMULATION OF CRYSTAL-GROWTH WITH SURFACE DIFFUSION [J].
GILMER, GH ;
BENNEMA, P .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (04) :1347-+
[9]  
GILMER GH, 2007, COMMUNICATION
[10]   An atomistic simulator for thin film deposition in three dimensions [J].
Huang, HC ;
Gilmer, GH ;
de la Rubia, TD .
JOURNAL OF APPLIED PHYSICS, 1998, 84 (07) :3636-3649