Deposition of SiO2 thin films by atmospheric pressure glow plasma on polycarbonate

被引：9
|
作者：
Masuda, Shohei [1 ]
Tanaka, Kunihito [1 ]
Kogoma, Masuhiro [1 ]
机构：
[1] Sophia Univ, Dept Chem, Fac Sci & Technol, Tokyo 102, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2008年 / 21卷 / 02期
关键词：
SiO2; plasma CVD; polycarbonate;
D O I：
10.2494/photopolymer.21.263
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
SiO2 films were deposited using both atmospheric glow plasma chemical deposition (APG-CVD) and spin coating as hard coating agents for their abrasion resistance. Tetracthoxysilane (TEOS) was used as the precursor. We formed films by spin coating on surfaces over APG-CVD as adhesive interlayer, and were able to achieve a hard deposited film without any cracks.
引用
收藏
页码：263 / 266
页数：4
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