X-ray absorption fine structure (XAFS) of Si wafer measured using total reflection X-rays

被引:9
作者
Kawai, J [1 ]
Hayakawa, S
Kitajima, Y
Gohshi, Y
机构
[1] Kyoto Univ, Dept Mat Sci & Engn, Sakyo Ku, Kyoto 6068501, Japan
[2] Univ Tokyo, Dept Appl Chem, Bunkyo Ku, Tokyo 1130033, Japan
[3] High Energy Accelerator Res Org, Inst Mat Struct Sci, Photon Factory, Tsukuba, Ibaraki 3050801, Japan
关键词
X-ray absorption; EXAFS; XANES; total reflection X-rays;
D O I
10.1016/S0584-8547(98)00209-2
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Extended X-ray absorption fine structure (EXAFS) and X-ray absorption near edge structure (XANES) spectra of a Si wafer are measured using grazing incidence X-rays, The spectra are measured using the total electron yield method. Fourier transform of the measured EXAFS oscillation is compared among different glancing angles. It is concluded that the XANES spectra are more sensitive to the surface Si-O bond than the EXAFS spectra. The source of probing depth difference of XAFS spectroscopy estimated by different researchers are discussed. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:215 / 222
页数:8
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