X-ray absorption fine structure (XAFS) of Si wafer measured using total reflection X-rays

被引：9
作者：
Kawai, J [1 ]
Hayakawa, S
Kitajima, Y
Gohshi, Y
机构：
[1] Kyoto Univ, Dept Mat Sci & Engn, Sakyo Ku, Kyoto 6068501, Japan
[2] Univ Tokyo, Dept Appl Chem, Bunkyo Ku, Tokyo 1130033, Japan
[3] High Energy Accelerator Res Org, Inst Mat Struct Sci, Photon Factory, Tsukuba, Ibaraki 3050801, Japan
来源：
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY | 1999年 / 54卷 / 01期
关键词：
X-ray absorption; EXAFS; XANES; total reflection X-rays;
D O I：
10.1016/S0584-8547(98)00209-2
中图分类号：
O433 [光谱学];
学科分类号：
0703 ; 070302 ;
摘要：
Extended X-ray absorption fine structure (EXAFS) and X-ray absorption near edge structure (XANES) spectra of a Si wafer are measured using grazing incidence X-rays, The spectra are measured using the total electron yield method. Fourier transform of the measured EXAFS oscillation is compared among different glancing angles. It is concluded that the XANES spectra are more sensitive to the surface Si-O bond than the EXAFS spectra. The source of probing depth difference of XAFS spectroscopy estimated by different researchers are discussed. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：215 / 222
页数：8
相关论文
共 71 条
  • [1] PROBING DEPTH OF SOFT-X-RAY ABSORPTION-SPECTROSCOPY MEASURED IN TOTAL-ELECTRON-YIELD MODE
    ABBATE, M
    GOEDKOOP, JB
    DEGROOT, FMF
    GRIONI, M
    FUGGLE, JC
    HOFMANN, S
    PETERSEN, H
    SACCHI, M
    [J]. SURFACE AND INTERFACE ANALYSIS, 1992, 18 (01) : 65 - 69
  • [2] In-situ polarization-dependent total-reflection fluorescence XAFS studies on the structure transformation of Pt clusters on alpha-Al2O3(0001)
    Asakura, K
    Chun, WJ
    Shirai, M
    Tomishige, K
    Iwasawa, Y
    [J]. JOURNAL OF PHYSICAL CHEMISTRY B, 1997, 101 (28): : 5549 - 5556
  • [3] IN-SITU ASYMMETRIC STRUCTURE-ANALYSIS OF PT CLUSTERS ON ALPHA-AL2O3(0001) IN H-2 REDUCTION AND NO ADSORPTION
    ASAKURA, K
    TOMISHIGE, K
    SHIRAI, M
    CHUN, WJ
    YOKOYAMA, T
    IWASAWA, Y
    [J]. PHYSICA B, 1995, 208 (1-4): : 637 - 640
  • [4] ASYMMETRIC STRUCTURE-ANALYSIS OF ACTIVE SURFACE-SITES BY IN-SITU POLARIZED TOTAL-REFLECTION FLUORESCENCE EXAFS
    ASAKURA, K
    SHIRAI, M
    IWASAWA, Y
    [J]. CATALYSIS LETTERS, 1993, 20 (1-2) : 117 - 124
  • [5] BALUT A, 1993, JPN J APPL PHYS S, V322, P422
  • [6] NEAR-SURFACE STRUCTURE DETERMINATION USING X-RAY REFLECTION-ABSORPTION SPECTROSCOPY
    BORTHEN, P
    STREHBLOW, HH
    [J]. PHYSICA B, 1995, 208 (1-4): : 421 - 422
  • [7] EXAMINATION OF PASSIVE FILMS ON METALS WITH X-RAY REFLECTION-ABSORPTION SPECTROSCOPY
    BORTHEN, P
    HECHT, D
    ABELS, JM
    STREHBLOW, HH
    [J]. PHYSICA B, 1995, 208 (1-4): : 409 - 410
  • [8] Surface structure analysis of dispersed metal sites on single crystal metal oxides by means of polarization-dependent total-reflection fluorescent EXAFS
    Chun, WJ
    Asakura, K
    Iwasawa, Y
    [J]. APPLIED SURFACE SCIENCE, 1996, 100 : 143 - 146
  • [9] PTRF X-ray absorption fine structure as a new technique for catalyst characterization
    Chun, WJ
    Shirai, M
    Tomishige, K
    Asakura, K
    Iwasawa, Y
    [J]. JOURNAL OF MOLECULAR CATALYSIS A-CHEMICAL, 1996, 107 (1-3) : 55 - 65
  • [10] Application of a CdTe solid-state detector to polarization-dependent total-reflection fluorescence XAFS measurements
    Chun, WJ
    Asakura, K
    Iwasawa, Y
    [J]. JOURNAL OF SYNCHROTRON RADIATION, 1996, 3 : 160 - 162
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