Current status of research and development for three-dimensional chip stack technology

被引:139
作者
Takahashi, K
Terao, H
Tomita, Y
Yamaji, Y
Hoshino, M
Sato, T
Morifuji, T
Sunohara, M
Bonkohara, M
机构
[1] Assoc Super Adv Elect Technol, Tsukuba Res Ctr, Elect Syst Integrat Technol Res Dept, TCI, Tsukuba, Ibaraki 3050047, Japan
[2] Assoc Super Adv Elect Technol, Elect Syst Integrat Technol Res Dept, Headquarter Off, Koto Ku, Tokyo 1358073, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2001年 / 40卷 / 4B期
关键词
electronic system integration; three-dimensional packaging; through-via; wafer thinning; flip-chip bonding; under-fill; thermal management;
D O I
10.1143/JJAP.40.3032
中图分类号
O59 [应用物理学];
学科分类号
摘要
The national project of "Ultra High-Density Electronic System Integgration" was initiated in 1999. This is the first project to focus on a niche area between electronic devices and systems. It aims to develop technologies for overcoming the problems in terms of performance of electronic systems. Three-dimensional (3D) LSI chip stacking, optoelectronics hybrid integration, and optimum circuit design are the technology categories. For the 3D stacking technology, a chip-based stacking technology is under extensive development that includes wafer preparation for chip stacking, wafer thinning, chip stacking, and inspection and testing. In this paper, the current development status of the 3D stacking technology, called V-STACK technology, is introduced.
引用
收藏
页码:3032 / 3037
页数:6
相关论文
共 7 条
  • [1] BONKOHARA M, 1998, P 4 S MICR ASS TECHN, P1
  • [2] BONKOHARA M, 1999, P 6 ANN KGD IND WORK
  • [3] HISANO K, 1995, P ASME JSME THERM EN, V4, P193
  • [4] ISHINO M, 1999, EMC, V140, P117
  • [5] Future system-on-silicon LSI chips
    Koyanagi, N
    Kurino, H
    Lee, KW
    Sakuma, K
    Miyakawa, N
    Itani, H
    [J]. IEEE MICRO, 1998, 18 (04) : 17 - 22
  • [6] YOSHIKAWA M, 1996, TRC NEWS, V55, P34
  • [7] 2000, P ANN REP M E SI DEP