Characterization of Atomic Layer Deposited Cobalt Oxide

被引：5
|
作者：
Holden, K. E. K. [1 ]
Jenkins, M. A. [1 ]
Conley, J. F., Jr. [1 ]
机构：
[1] Oregon State Univ, Sch Elect Engn & Comp Sci, Corvallis, OR 97330 USA
来源：
SELECTED PROCEEDINGS FROM THE 233RD ECS MEETING | 2018年 / 85卷 / 13期
基金：
美国国家科学基金会;
关键词：
OPTICAL-PROPERTIES; THIN-FILMS; CO3O4;
D O I：
10.1149/08513.0735ecst
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
The electrical, optical, and structural properties of cobalt oxide films deposited via atomic layer deposition using Co(Cp)(2) and O-3 are investigated. At 250 degrees C, growth is 0.50 angstrom per cycle and smooth uniform films are deposited across a 5 '' wafer with atomic force microscopy showing a root mean square roughness of 0.4 nm. Spectroscopic ellipsometry indicates a refractive index of approximately 2.8 at 632.8 nm while grazing incidence X-ray diffraction of as-deposited films shows cubic Co3O4, a p-type semiconducting phase. Semiconducting behavior is supported by current density versus electric field measurements.
引用
收藏
页码：735 / 741
页数：7
相关论文
共 50 条
  • [1] Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates
    Kalam, Kristjan
    Seemen, Helina
    Mikkor, Mats
    Jogiaas, Taivo
    Ritslaid, Peeter
    Tamm, Aile
    Kukli, Kaupo
    Kasikov, Aarne
    Link, Joosep
    Stern, Raivo
    Duenas, Salvador
    Castan, Helena
    THIN SOLID FILMS, 2019, 669 : 294 - 300
  • [2] Atomic layer deposited cobalt oxide: An efficient catalyst for NaBH4 hydrolysis
    Nandi, Dip K.
    Manna, Joydev
    Dhara, Arpan
    Sharma, Pratibha
    Sarkar, Shaibal K.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2016, 34 (01):
  • [3] ATOMIC LAYER DEPOSITED P-TYPE NICKEL OXIDE AND COBALT OXIDE FOR ETHANOL GAS SENSING
    Stehle, Jochen
    Samarao, Ashwin K.
    Krishnamoorthy, Uma
    Ambacher, Oliver
    2017 19TH INTERNATIONAL CONFERENCE ON SOLID-STATE SENSORS, ACTUATORS AND MICROSYSTEMS (TRANSDUCERS), 2017, : 1504 - 1507
  • [4] Thin Films of Cobalt Oxide Deposited on High Aspect Ratio Supports by Atomic Layer Deposition
    Diskus, Madeleine
    Nilsen, Ola
    Fjellvag, Helmer
    CHEMICAL VAPOR DEPOSITION, 2011, 17 (4-6) : 135 - 140
  • [5] Compositional characterization of atomic layer deposited alumina
    Philip, Anu
    Thomas, Subin
    Kumar, K. Rajeev
    OPTOELECTRONIC MATERIALS AND THIN FILMS (OMTAT 2013), 2014, 1576 : 183 - 185
  • [6] Thin film characterization of zinc tin oxide deposited by thermal atomic layer deposition
    Mullings, Marja N.
    Haegglund, Carl
    Tanskanen, Jukka T.
    Yee, Yesheng
    Geyer, Scott
    Bent, Stacey F.
    THIN SOLID FILMS, 2014, 556 : 186 - 194
  • [7] Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides
    Seemen, Helina
    Rahn, Mihkel
    Kalam, Kristjan
    Sajavaara, Timo
    Duenas, Salvador
    Castan, Helena
    Link, Joosep
    Stern, Raivo
    Kukli, Kaupo
    Tamm, Aile
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2018, 7 (08) : P402 - P409
  • [8] Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
    Briggs, B. D.
    Bishop, S. M.
    Leedy, K. D.
    Cady, N. C.
    THIN SOLID FILMS, 2014, 562 : 519 - 524
  • [9] Optical and electrical characterization of hafnium oxide deposited by liquid injection atomic layer deposition
    Taechakumput, P.
    Taylor, S.
    Buiu, O.
    Potter, R. J.
    Chalker, P. R.
    Jones, A. C.
    MICROELECTRONICS RELIABILITY, 2007, 47 (4-5) : 825 - 829
  • [10] Atomic-layer deposited thulium oxide as a passivation layer on germanium
    Mitrovic, I. Z.
    Hall, S.
    Althobaiti, M.
    Hesp, D.
    Dhanak, V. R.
    Santoni, A.
    Weerakkody, A. D.
    Sedghi, N.
    Chalker, P. R.
    Henkel, C.
    Litta, E. Dentoni
    Hellstrom, P. -E.
    Ostling, M.
    Tan, H.
    Schamm-Chardon, S.
    JOURNAL OF APPLIED PHYSICS, 2015, 117 (21)
12345