Low polarization dependent diffraction grating for wavelength demultimlexing

被引：28
作者：
Popov, E [1 ]
Hoose, J
Frankel, B
Keast, C
Fritze, M
Fan, TY
Yost, D
Rabe, S
机构：
[1] Fac Sci & Tech St Jerome, CNRS, UMR 6133, Inst Fresnel, F-13397 Marseille 20, France
[2] Chromaplex Inc, W Henrietta, NY 14586 USA
[3] MIT, Lincoln Lab, Lexington, MA 02420 USA
来源：
OPTICS EXPRESS | 2004年 / 12卷 / 02期
关键词：
D O I：
10.1364/OPEX.12.000269
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A low polarization dependent, high diffraction efficiency grating for wavelength demultiplexer is proposed, manufactured by standard crystallographic etching of Si surface. Light is incident and diffracted inside the wafer, which is covered with reflecting metal. Optimized groove form results in a flat spectral response for TE and TM polarizations. (C) 2004 Optical Society of America.
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页码：269 / 275
页数：7
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