Electrical Characteristics of Horizontally and Vertically Oriented Few-Layer Graphene on Si-Based Dielectrics

被引:2
|
作者
Behura, Sanjay K. [1 ,2 ,5 ]
Yang, Qiaoqin [3 ]
Hirose, Akira [4 ]
Nayak, Sasmita [1 ]
Jani, Omkar [1 ]
Mukhopadhyay, Indrajit [2 ]
机构
[1] Gujarat Energy Res & Management Inst, Res Innovat & Incubat Ctr, Solar Energy Res Wing, Gandhinagar 382007, Gujarat, India
[2] Pandit Deendayal Petr Univ, Sch Solar Energy, Gandhinagar 382007, Gujarat, India
[3] Univ Saskatchewan, Dept Mech Engn, Saskatoon, SK S7N 5A9, Canada
[4] Univ Saskatchewan, Dept Phys & Engn Phys, Plasma Phys Lab, Saskatoon, SK S7N 5E2, Canada
[5] Univ Illinois, Dept Chem Engn, 810 S Clinton St, Chicago, IL 60607 USA
基金
加拿大自然科学与工程研究理事会;
关键词
Nanostructures; Vapor Deposition; Atomic Force Microscopy; Raman Spectroscopy; Defects; Heterojunction; THEORETICAL SIMULATION; RAMAN-SPECTROSCOPY; OXIDE; GRAPHITE; HYDROGENATION; REDUCTION; DISORDER; GROWTH;
D O I
10.1166/jnn.2016.11028
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Horizontally and vertically oriented few-layer graphenes have been synthesized directly on SiO2 coated Si substrates via thermal and hot-filament chemical vapor deposition, respectively. The effect of the direction of mass flow on the fabrication of graphene film is analysed and a plausible mechanism is proposed. The graphene/p-Si heterojunction is fabricated and tested for its potential in optoelectronic devices. Rectification behaviour is observed at the interface of graphene/p-Si under dark conditions. A dark current of 1.1 mA with an ideality factor of 1.5, in addition of a high rectification ratio of 15.99 at +/- 0.5 V is found for the vertically oriented graphene/p-Si heterojunction.
引用
收藏
页码:6246 / 6251
页数:6
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