Investigation of the physical properties of nanostructured CO:NiO thin films

被引：0

作者：

Ghougali, M. ^{[1
]}

Belahssen, O. ^{[2
]}

Benhamida, S. ^{[3
]}

Mimouni, M. ^{[1
]}

Rihia, G. ^{[1
]}

Mahboub, M. S. ^{[1
]}

Beggas, A. ^{[1
]}

机构：

[1] Univ El Oued, LEVRES Lab, BP 789, El Oued 39000, Algeria

[2] Univ Biskra, Phys Lab Thin Films & Applicat LPCMA, BP 145 RP, Biskra 07000, Algeria

[3] Kasdi Merbah Univ, Fac Math & Matter Sci, LRPPS Lab, Ouargla 30000, Algeria

来源：

CHALCOGENIDE LETTERS | 2021年 / 18卷 / 12期

关键词：

Co-doping; NiO thin films; XRD; Optical properties; Electrical conductivity; BAND-GAP; NANOPARTICLES;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this paper, the Co:NiO thin films were deposited on glass substrates under the temperature of (480 degrees C) by spray pyrolysis technique )SPT), and their structural, electrical and optical properties were studied. The films prepared with a molar concentration of 0.2 mol/l from solutions of nickel nitrate and cobalt (II) chloride hexahydrate. The XRD results showed that the films have a fcc structure with preferred orientation (111). The optical band gap energy and Urbach energy were found ranging between 3.61 to 3.48 eV and 0.353 to 0.915 eV respectively. The maximum value of electrical conductivity was 0.08961 Omega-1.cm-1, it was obtained at 12 at.%.

引用

页码：765 / 775

页数：11

共 31 条

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