Three-dimensional nanoscale molecular imaging by extreme ultraviolet laser ablation mass spectrometry

被引：106

作者：

Kuznetsov, Ilya ^{[1
,2
]}

Filevich, Jorge ^{[1
,2
]}

Dong, Feng ^{[1
,3
]}

Woolston, Mark ^{[1
,2
]}

Chao, Weilun ^{[1
,4
]}

Anderson, Erik H. ^{[1
,4
]}

Bernstein, Elliot R. ^{[1
,3
]}

Crick, Dean C. ^{[5
]}

Rocca, Jorge J. ^{[1
,2
,6
]}

Menoni, Carmen S. ^{[1
,2
,3
]}

机构：

[1] Colorado State Univ, NSF Ctr Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA

[2] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

[3] Colorado State Univ, Dept Chem, Ft Collins, CO 80523 USA

[4] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

[5] Colorado State Univ, Dept Microbiol Immunol & Pathol, Ft Collins, CO 80523 USA

[6] Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USA

来源：

NATURE COMMUNICATIONS | 2015年 / 6卷

关键词：

X-RAY LASER; IONIZATION; TRANSMISSION; PROTEINS; TISSUE; CELLS; MS; 3D;

D O I：

10.1038/ncomms7944

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

Analytical probes capable of mapping molecular composition at the nanoscale are of critical importance to materials research, biology and medicine. Mass spectral imaging makes it possible to visualize the spatial organization of multiple molecular components at a sample's surface. However, it is challenging for mass spectral imaging to map molecular composition in three dimensions (3D) with submicron resolution. Here we describe a mass spectral imaging method that exploits the high 3D localization of absorbed extreme ultraviolet laser light and its fundamentally distinct interaction with matter to determine molecular composition from a volume as small as 50 zl in a single laser shot. Molecular imaging with a lateral resolution of 75 nm and a depth resolution of 20 nm is demonstrated. These results open opportunities to visualize chemical composition and chemical changes in 3D at the nanoscale.

引用

页数：6

共 23 条

[1] Specialized electron beam nanolithography for EUV and X-ray diffractive optics [J].