Passivation of type IIInAs/GaSb superlattice photodiodes

被引:81
作者
Gin, A [1 ]
Wei, YJ [1 ]
Bae, JJ [1 ]
Hood, A [1 ]
Nah, J [1 ]
Razeghi, M [1 ]
机构
[1] Northwestern Univ, Dept Elect & Comp Engn, Ctr Quantum Devices, Evanston, IL 60208 USA
关键词
InAs/GaSb superlattices; photodiodes; surface passivation; type II; infrared detector;
D O I
10.1016/j.tsf.2003.09.002
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Recently, excellent infrared detectors have been demonstrated using Type II InAs/GaSb superlattice materials sensitive at wavelengths from 3 mum to greater than 32 mum. These results indicate that Type II superlattice devices may challenge the preponderance of HgCdTe and other state-of-the-art infrared material systems. As such, surface passivation is becoming an increasingly important issue as progress is made towards the commercialization of Type II devices and focal plane array applications. This work focuses on initial attempts at surface passivation of Type II InAs/GaSb superlattice photodiodes using PECVD-grown thin layers of SiO2. Our results indicate that silicon dioxide coatings deposited at various temperatures improve photodetector resistivity by several times. Furthermore, reverse-bias dark current has been reduced significantly in passivated devices. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:489 / 492
页数:4
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