Contact Doping and Ultrathin Gate Dielectrics for Nanoscale Organic Thin-Film Transistors

被引:115
|
作者
Ante, Frederik [1 ]
Kaelblein, Daniel [1 ]
Zschieschang, Ute [1 ]
Canzler, Tobias W. [5 ]
Werner, Ansgar [5 ]
Takimiya, Kazuo [2 ]
Ikeda, Masaaki [3 ]
Sekitani, Tsuyoshi [4 ]
Someya, Takao [4 ]
Klauk, Hagen [1 ]
机构
[1] Max Planck Inst Solid State Res, D-70569 Stuttgart, Germany
[2] Hiroshima Univ, Dept Appl Chem, Grad Sch Engn, Inst Adv Mat Res, Higashihiroshima 724, Japan
[3] Nippon Kayaku Co Ltd, Funct Chem R&D Labs, Kita Ku, Tokyo 115, Japan
[4] Univ Tokyo, Dept Elect Engn, Tokyo 113, Japan
[5] Novaled AG, Dresden, Germany
关键词
FIELD-EFFECT TRANSISTORS; SELF-ASSEMBLED MONOLAYER; INDUCED PHASE-TRANSITION; NM CHANNEL-LENGTH; ZINC PHTHALOCYANINE; LOW-VOLTAGE; PENTACENE; TETRAFLUOROTETRACYANOQUINODIMETHANE; SEMICONDUCTOR;
D O I
10.1002/smll.201002254
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
To suppress undesirable short-channel effects in organic transistors with nanoscale lateral dimensions, aggressive gate-dielectric scaling (using an ultra-thin monolayer-based gate dielectric) and area-selective contact doping (using a strong organic dopant) are introduced into organic transistors with channel lengths and gate-to-contact overlaps of about 100 nm. These nanoscale organic transistors have off-state drain currents below 1 pA, on/off current ratios near 107, and clean linear and saturation characteristics. © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:1186 / 1191
页数:6
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