Design of protective topcoats for immersion lithography

被引：17
作者：
Allen, RD [1 ]
Brock, PJ
Sundberg, L
Larson, CE
Wallraff, GM
Hinsberg, WD
Meute, J
Shimokawa, T
Chiba, T
Slezak, M
机构：
[1] IBM Almaden Res Ctr, San Jose, CA USA
[2] IBM Assignee, Int Sematech, Austin, TX USA
[3] JSR Corp, Yokaichi, Japan
[4] JSR Micro, Sunnyvale, CA USA
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2005年 / 18卷 / 05期
关键词：
immersion lithography; topcoats; PAG extraction; leaching; fluoropolymers;
D O I：
10.2494/photopolymer.18.615
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Interactions of water and 193nm resists are described and detailed. Leaching of PAGs is experimentally verified, and the influence of PAG structure on leaching rate is determined. The mode of action of immersion topcoats is described. The influence of the topcoat/resist interaction in assessed. Finally, the design evolution of immersion topcoats with desirable properties is discussed.
引用
收藏
页码：615 / 619
页数：5
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