A Study on the Fabrication and Structural Properties of Al-Co/AlN-Co Thin Films

被引：3
|
作者：
Han, Chang-Suk [1 ]
Han, Seung-Oh [2 ]
机构：
[1] Hoseo Univ, Dept Def Sci & Technol, Asan 336795, Chungnam, South Korea
[2] Hoseo Univ, Inst Fus Technol, Asan 336795, Chungnam, South Korea
来源：
KOREAN JOURNAL OF METALS AND MATERIALS | 2011年 / 49卷 / 03期
关键词：
thin films; sputtering; magnetic properties; X-ray diffraction; resistivity; SOFT-MAGNETIC-PROPERTIES; MULTILAYER FILMS;
D O I：
10.3365/KJMM.2011.49.3.256
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We have synthesized Al-Co/AlN-Co multilayer films with different layer thicknesses by using a Two-Facing Target Type dc Sputtering (TFTS) system. The deposited films were annealed isothermally at different temperatures and their microstructure, magnetic properties and resistivity were investigated. The magnetization of the as-deposited films was found to be very small, irrespective of layer thickness. It was found that the annealing conditions and layer thickness ratio of Al-Co to AlN-Co (LTR) were able to control the microstructure, as well as the physical properties of the prepared films. The resistivity and magnetization increased and the coercivity decreased with a decreasing LTR. A high resistivity of 2500 mu Omega-cm, a magnetization of 360 emu/cm(3), and a coercivity of 5 Oe were obtained for the films with LTR=0.175.
引用
收藏
页码：256 / 263
页数：8
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