Mechanical behavior of thin films

被引:187
作者
Vinci, RP
Vlassak, JJ
机构
[1] Dept. of Mat. Sci. and Engineering, Stanford University, Stanford
来源
ANNUAL REVIEW OF MATERIALS SCIENCE | 1996年 / 26卷
关键词
stress; strain; mechanical testing; mechanical properties;
D O I
10.1146/annurev.ms.26.080196.002243
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The mechanical properties of thin films differ significantly from those of bulk materials due, largely, to the effects of interfaces, microstructure, and thick underlying substrates. Specialized experimental techniques have been developed to determine mechanical properties and the strain and stress states of both free-standing films and films bonded to substrates. In this review, recent innovations in measurement of thin film properties are considered. Included are discussions of nanoindentation, bulge testing, substrate curvature, X-ray diffraction, micro-Raman spectroscopy, and electron diffraction contrast imaging. Selected recent advances in the understanding of continuous thin film and patterned thin film mechanical behavior are also presented. Examples include low-temperature and high-temperature plastic flow in Al and Cu films, strain energy effects on film morphology, hardness enhancement in multilayers, and stress in passivated Al lines.
引用
收藏
页码:431 / 462
页数:32
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