Improvement of InGaN-GaN light-emitting diode performance with a nano-roughened p-GaN surface

被引:94
作者
Huang, HW [1 ]
Kao, CC
Chu, JI
Kuo, HC
Wang, SC
Yu, CC
机构
[1] Natl Chiao Tung Univ, Dept Photon, Hsinchu 300, Taiwan
[2] Natl Chiao Tung Univ, Inst Electroopt Engn, Hsinchu 300, Taiwan
[3] True Light Corp, Hsinchu 300, Taiwan
[4] Global Union Technol Corp, Hsinchu 300, Taiwan
关键词
gallium nitride (GaN); light-emitting diode (LED); nano-mask; nickel;
D O I
10.1109/LPT.2005.846741
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This investigation describes the development of InGaN-GaN light-emitting diode (LED) with a nano-roughened top p-GaN surface which uses Ni nano-mask and wet etching. The light output of the InGaN-GaN LED with a nano-roughened top p-GaN surface is 1.4 times that of a conventional LED, and wall-plug efficiency is 45% higher. The operating voltage of InGaN-GaN LED was reduced from 3.65 to 3.5 V at 20 mA and the series resistance was reduced by 20%. The light output is increased by the nano-roughening of the top p-GaN surface. The reduction in the series resistance can be attributed to the increase in the contact area of nano-roughened surface.
引用
收藏
页码:983 / 985
页数:3
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