Frequency dependency of the characteristics in the spiral type thin film inductors

被引：0
|
作者：
Min, BK [1 ]
Kim, IS [1 ]
Song, JS [1 ]
机构：
[1] Korea Electrotechnol Res Inst, Chang Won 641120, South Korea
来源：
MICRO- AND NANOTECHNOLOGY: MATERIALS, PROCESSES, PACKAGING, AND SYSTEMS II | 2005年 / 5650卷
关键词：
spiral inductor; inductance; quality factor; thin film;
D O I：
10.1117/12.582204
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this study, spiral inductors on the SiO2/Si(100) substrate were fabricated by the magnetron sputtering method. Cu thin film with the thickness of 0.7-2.0 mu m was deposited on the substrate. Square inductors were fabricated through the wet chemical etching technique. The inductors are completely specified by the number of turns, coil width and the cod spacing. Both the width and spacing were varied from 10 to 50 mu m and from 20 to 70 mu m, respectively. The Frequency dependency of inductance and Q factor were investigated to analyze the performance of spiral inductors.
引用
收藏
页码：400 / 407
页数：8
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