Short communication: Assessment of the dislocation density using X-ray topography in Al single crystals annealed for long times near the melting temperature

被引:3
作者
Singh, S. P. [1 ]
Huang, X-R [2 ]
Kumar, P. [1 ]
Kassner, M. E. [3 ]
机构
[1] Indian Inst Sci, Dept Mat Engn, Bangalore 560012, Karnataka, India
[2] Argonne Natl Lab, Adv Photon Source, 9700 S Cass Ave, Argonne, IL 60439 USA
[3] Univ Southern Calif, Dept Chem Engn & Mat Sci, Los Angeles, CA 90007 USA
来源
MATERIALS TODAY COMMUNICATIONS | 2019年 / 21卷
基金
美国国家科学基金会;
关键词
Annealing; Dislocation density; X-ray topography; HARPER-DORN-CREEP; ALUMINUM;
D O I
10.1016/j.mtcomm.2019.100613
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Earlier work by the authors determined the dislocation density as a function of time in aluminum single crystals annealed near the melting temperature using etch-pits. It was found that the dislocation density is stable and unchanged even with annealing times up to one year for statically annealed Al single crystals with an initially low dislocation density. As several investigators have suggested that etch-pits are not reliable compared to transmission electron microscopy in assessing the dislocation density, the current study utilized x-ray topography at a synchrotron for dislocation density measurements. This work, then, is a short paper complementing the authors earlier work by using a new, reliable, but rarely utilized non-destructive technique to measure the dislocation density. The results confirm the trend of the earlier study using etch-pits by the authors.
引用
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页数:5
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