Electron beam induced carbon deposition using hydrocarbon contamination for XTEM analysis

被引：11

作者：

Luo, J. S. ^{[1
]}

Sung, C. S. ^{[1
]}

Hsu, W. S. ^{[1
]}

Huang, L. Y. ^{[1
]}

Russell, J. D. ^{[1
]}

机构：

[1] Inotera Memories Inc, Phys & Elect Failure Anal Dept, Tao Yuan, Taiwan

来源：

MICROELECTRONICS RELIABILITY | 2010年 / 50卷 / 9-11期

关键词：

FOCUSED ION-BEAM; LIFT-OUT; SPECIMEN PREPARATION; DAMAGE; MICROSCOPY; SAMPLES;

D O I：

10.1016/j.microrel.2010.07.046

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The optimal parameters of electron beam induced carbon deposition (EBICD) using hydrocarbon contamination were studied as a function of electron beam energy and scanning time to avoid the mixing or damage layer formation at the interface of the electron beam assisted Pt protection layer and the sample surface by dual beam focused ion beam (DB FIB) for cross sectional transmission electron microscopy (XTEM) analysis. The optimal condition of EBICD was determined. The thickness of EBICD layer increases with electron beam scanning time and amount of hydrocarbon contamination on the sample surface. EBICD using hydrocarbon contamination successfully provides a carbon protection layer for XTEM analysis. (C) 2010 Elsevier Ltd. All rights reserved.

引用

页码：1446 / 1450

页数：5