Auger electron spectroscopy analysis of high metal content micro-structures grown by electron beam induced deposition

被引：15

作者：

Cicoira, F

Hoffmann, P ^{[1
]}

Olsson, COA

Xanthopoulos, N

Mathieu, HJ

Doppelt, P

机构：

[1] Ecole Polytech Fed Lausanne, LOA, CH-1015 Lausanne, Switzerland

[2] Ecole Polytech Fed Lausanne, LMCH, CH-1015 Lausanne, Switzerland

[3] CNRS, Ctr Etud Chim Met, F-94407 Vitry Sur Seine, France

来源：

APPLIED SURFACE SCIENCE | 2005年 / 242卷 / 1-2期

关键词：

Chemical vapor deposition; Auger electron spectroscopy; nanomaterials;

D O I：

10.1016/j.apsusc.2004.08.005

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

An auger electron spectroscopy study was carried out on Rh-containing micro-structures grown by electron beam induced deposition (EBID) of the iso-structural and iso-electronic precursors [RhCl(PF3)(2)](2) and [RhCI(CO)(2)](2). A material containing between 55 and 60 at.% Rh was obtained from both precursors. The chemical composition of structures grown from the two different precursors indicates a similar decomposition mechanism. Deposits grown from [RhCl(PF3)(2)](2) showed a chemical composition independent of electron energy and electron dose in the investigated range of conditions. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：107 / 113

页数：7

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