Modification of surface forces by metal ion adsorption

被引:6
|
作者
Vithayaveroj, V
Yiacoumi, S
Tsouris, C
机构
[1] Georgia Inst Technol, Atlanta, GA 30332 USA
[2] Oak Ridge Natl Lab, Oak Ridge, TN 37831 USA
关键词
atomic force microscopy (AFM); metal adsorption; surface charge reversal; colloidal forces;
D O I
10.1081/DIS-120021806
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Sorption of ions may lead to variations in interparticle forces and, thus, changes in the stability of colloidal particles. Chemical interactions between metal ions and colloidal particles modify the molecular structure of the surface, the surface charge, and the electrical potential between colloidal particles. These modifications to the surface and to the electrical double layer due to metal ion sorption are reflected in the interaction force between a particle and another surface, which is measured in this study by atomic force microscopy (AFM). Specifically, AFM is used to investigate the sorption of copper ions from aqueous solutions by silica particles. The influence of metal ion concentration and solution ionic strength on surface forces is studied under transient conditions. Results show that as the metal ion concentration is decreased, charge reversal occurs and a longer period of time is required for the system to reach equilibrium. The ionic strength has no significant effect on sorption kinetics. Furthermore, neither metal concentration nor ionic strength exhibits any effect on sorption equilibria, indicating that for the experimental conditions used in this study, the surface sites of the silica particle are fully occupied by copper ions.
引用
收藏
页码:517 / 525
页数:9
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