Compressive behavior of an electrodeposited nanostructured copper at quasistatic and high strain rates

被引:62
作者
Jia, D
Ramesh, KT
Ma, E
Lu, L
Lu, K
机构
[1] Johns Hopkins Univ, Dept Mech Engn, Baltimore, MD 21218 USA
[2] Johns Hopkins Univ, Dept Mat Sci & Engn, Baltimore, MD 21218 USA
[3] Acad Sinica, Inst Met Res, State Key Lab RSA, Shenyang 110015, Peoples R China
关键词
nc-copper; TEM; grain boundary; stress-strain curve; high strain rate;
D O I
10.1016/S1359-6462(01)01071-5
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Uniaxial compression experiments for an electrodeposited nanostructured copper were performed at quasistatic strain rates of 4 x 10(-4) s(-1) and high strain rates of 3 x 10(3)-2 x 10(4) s(-1). The mechanical behavior of the no-Cu, including strength, strain hardening and strain-rate dependence of flow stress, is presented. (C) 2001 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:613 / 620
页数:8
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