Wide band-gap semiconductors for cold cathodes: A theoretical analysis

被引:0
作者
Lerner, P
Cutler, PH
Miskovsky, NM
机构
来源
III-V NITRIDES | 1997年 / 449卷
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中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper we describe the field emission from wide band-gap semiconductor thin film electron sources as a three-step process. Internal field emission is the mechanism for electron injection at the metal-semiconductor cathode interface. Under an internal field, electrons injected into the conduction band can propagate quasi-ballistically through the thin semiconductor film. At the vacuum interface, they are field emitted across a PEA or NEA surface. Consistent with the electron injection mechanism we have done molecular dynamics simulations for GaN films with an initial energy distribution corresponding to a Fowler-Nordheim (FN) spectrum. Results demonstrate quasi-ballistic propagation and approximate preservation of the FN energy distribution. Furthermore, high levels of n-doping in GaN (similar to 10(17)cm(-3)) do not inhibit transport in thin films (<0.1 mu m).
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页码:1109 / 1114
页数:6
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