New Interferometric Approaches for Process and Product Quality Control

被引：0

作者：

Gudelev, Valery

Smirnov, Andrey

Schreiber, Juergen ^{[1
,2
]}

机构：

[1] Joint Insititute Nucl Res, Dubna, Russia

[2] Tech Univ Dresden, Dresden, Germany

来源：

MATERIALS TESTING | 2009年 / 51卷 / 10期

关键词：

Quality control;

D O I：

10.3139/120.110076

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We present two optical solutions being suitable for on-line fabrication control. The first technique is applicable to measure three dimensional profiles of microstructures at long working distance up to several tens of centimeters keeping the nanometer in-depth accuracy. The second is appropriate for the express space-resolved characterization of residual stress areas and microcracks in solar cell wafers.

引用

页码：652 / 658

页数：7

共 6 条

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