Poly(2-vinylnaphthalene)-block-poly(acrylic acid) Block Copolymer: Self-Assembled Pattern Formation, Alignment, and Transfer into Silicon via Plasma Etching

P2VN-b-PAA is a novel diblock copolymer which has potential as a self-assembled nanoscale patterning material. Thin spin cast P2VN-b-PAA films rapidly reorganize to vertical lamellar with exposure to acetone vapor. P2VN-b-PAA lamellar morphology was aligned by electric field under acetone vapor at a significantly faster rate and at lower electric field strengths than other polymer systems. Observed dry etching selectivity for P2VN to PAA were comparatively high for a variety of etch gases, consistent with estimations from Ohnishi and ring parameters. Block copolymer self assembled patterns were transferred to silicon via two-step CF4 and SF6 etching.