Heavy Alkali Treatment of Post-Sulfurized Cu(In,Ga)Se2 Layers: Effect on Absorber Properties and Solar Cell Performance

被引:16
作者
Keller, Jan [1 ]
Bilousov, Oleksandr V. [2 ]
Neerken, Janet [3 ]
Wallin, Erik [2 ]
Martin, Natalia M. [1 ]
Riekehr, Lars [1 ]
Edoff, Marika [1 ]
Platzer-Bjorkman, Charlotte [1 ]
机构
[1] Uppsala Univ, Div Solar Cell Technol, Angstrom Solar Ctr, S-75121 Uppsala, Sweden
[2] Solibro Res AB, Vallvagen 5, S-75151 Uppsala, Sweden
[3] Carl von Ossietzky Univ Oldenburg, Inst Phys, Ultrafast Nanoscale Dynam, D-26111 Oldenburg, Germany
来源
SOLAR RRL | 2020年 / 4卷 / 09期
关键词
Cu(In; Ga)Se-2; grain boundaries; KF-post-deposition treatments; RbF-post-deposition treatments; sulfurization; POSTDEPOSITION TREATMENT; THIN-FILMS; SURFACE SULFURIZATION; DEPOSITION TREATMENT; GRAIN-BOUNDARIES; BAND OFFSETS; EFFICIENCY; MECHANISMS; MODULES; CU(IN;
D O I
10.1002/solr.202000248
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
This contribution evaluates a sequential post-deposition treatment of Cu(In,Ga)Se-2(CIGS) films, consisting of 1) a post-sulfurization in elemental S-atmosphere and 2) a subsequent treatment by heavy alkali fluorides (Alk-PDT). First, the effect of the sulfurization step on the corresponding solar cell performance is investigated and optimum process parameters, leading to an efficiency improvement, are identified. Losses in carrier collection observed after S-incorporation are attributed to an increased grain boundary (GB) recombination. It is found that the corresponding reduction in short-circuit current density can be mitigated by a RbF- or KF-PDT, supposedly by depleting GBs in Cu. However, in strong contrast to non-sulfurized CIGS, the Alk-PDT results in a lower open-circuit voltage and distortions in the current-voltage (I-V) characteristics for sulfurized absorbers. Possible explanations are the absence of a wide-gap surface phase and/or air exposure between the post-treatment steps. It is further proposed that a back contact barrier may be responsible for the distortions inI-V.
引用
收藏
页数:14
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