Thermal activation effects in CoCrPtTa media due to stacking faults

被引:7
作者
Holloway, L [1 ]
Laidler, H [1 ]
机构
[1] Univ York, Dept Phys, York YO10 5DD, N Yorkshire, England
关键词
stacking faults; thermal activation;
D O I
10.1109/20.950870
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report magnetic measurements made on two CoCrPtTa thin film media, which were sputter deposited in identical conditions onto either CrMn or NiAl/CrMn underlayers grown on glass substrates. This produced films with [11 (2) over bar0] and [10 (1) over bar0] preferred orientations respectively. The films had stacking fault densities of 8 +/- 1% and 13 +/- 1 % respectively. Increased magnetic viscosity and switching at low fields in the switching field distributions were observed which correlates well with the level of fcc-like regions. We find that the energy barriers to reversal in these films are dominated by the anisotropy field distribution rather than the distribution of grain-sizes. Furthermore, it is clear that even relatively low levels of stacking faults cause significant levels of thermally activated magnetization reversal which may cause reduced thermal stability of written information.
引用
收藏
页码:1459 / 1461
页数:3
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