Charge injection and trapping in silicon nanocrystals

被引:66
|
作者
Rafiq, MA
Tsuchiya, Y
Mizuta, H
Oda, S
Uno, S
Durrani, ZAK
Milne, WI
机构
[1] Univ Cambridge, Cavendish Lab, Microelect Res Ctr, Cambridge CB3 0HE, England
[2] Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
[3] Japan Sci & Technol, SORST, Tokyo, Japan
[4] Univ Cambridge, Cavendish Lab, Hitachi Cambridge Lab, Cambridge CB3 0HE, England
[5] Univ Cambridge, Dept Engn, Elect Devices & Mat Grp, Cambridge CB2 1PZ, England
关键词
D O I
10.1063/1.2119431
中图分类号
O59 [应用物理学];
学科分类号
摘要
The temperature dependence of the conduction mechanism in thin films of similar to 8 nm diameter silicon nanocrystals is investigated using Al/Si nanocrystal/p-Si/Al diodes. A film thickness of 300 nm is used. From 300 to 200 K, space charge limited current, in the presence of an exponential distribution of trapping states, dominates the conduction mechanism. Using this model, a trap density N-t=2.3x10(17) cm(-3) and a characteristic trap temperature T-t=1670 K can be extracted. The trap density is within an order of magnitude of the nanocrystal number density, suggesting that most nanocrystals trap single or a few carriers at most. (C) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
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