Quantum chemical calculations of sulfur doping reactions in diamond CVD

被引:26
作者
Zhou, H
Yokoi, Y
Tamura, H
Takami, S
Kubo, M
Miyamoto, A
Gamo, MN
Ando, T
机构
[1] Tohoku Univ, Grad Sch Engn, Dept Chem Mat, Sendai, Miyagi 9808579, Japan
[2] Natl Inst Res Inorgan Mat, CREST, Tsukuba, Ibaraki 3050044, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2001年 / 40卷 / 4B期
关键词
diamond surface; sulfur doping; DFT calculation; semi-empirical molecular orbital calculation;
D O I
10.1143/JJAP.40.2830
中图分类号
O59 [应用物理学];
学科分类号
摘要
Recently, n-type semiconducting diamond was successfully obtained by sulfur doping using CH4/H2S/H-2 plasma chemical vapor deposition (CVD). It was reported that the crystal quality too was improved by the sulfur doping. In this study, the equilibrium geometry and the band structure of S- and O-doped diamond have been investigated using density function theory (DFT) calculations. Moreover, the sulfur incorporation mechanisms have been investigated by the semi-empirical molecular orbital (MO) calculations. Our calculations revealed that the sulfur atoms are spontaneously incorporated into the diamond (100) surface, while the incorporation of the oxygen atoms is unfavorable.
引用
收藏
页码:2830 / 2832
页数:3
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