The new ESRF thin film x-ray reflectometer

被引：4

作者：

Morawe, Ch. ^{[1
]}

Peffen, J-Ch. ^{[1
]}

Pakawanit, P. ^{[1
]}

机构：

[1] ESRF, Grenoble, France

来源：

ADVANCES IN X-RAY/EUV OPTICS AND COMPONENTS XIII | 2018年 / 10760卷

关键词：

x-ray optics; multilayers; x-ray instrumentation; REFLECTION;

D O I：

10.1117/12.2319833

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The ESRF Multilayer Laboratory has been operating a thin film x-ray reflectometer for more than 20 years. It is a critical piece of equipment needed to calibrate the multilayer deposition system and to characterize thin film based optical elements. The previous instrument had a number of drawbacks such as limitations in sample size and weight. In addition, the outdated control electronics had to be replaced. The new x-ray reflectometer was designed to handle up to 1 m long samples with a weight of 40 kg while maintaining a positioning accuracy of a few micrometres. The instrument includes a Cu K alpha micro-focus source followed by a Montel multilayer collimator. It can be operated in monochromatic or pink mode by inserting or removing a channel cut crystal monochromator. This work will give an overview on the mechanical and optical design. It will summarize performance benchmarks and give examples of measured x-ray spectra.

引用

页数：8