Tuning the electronic properties of MoSi2N4 by molecular doping: A first principles investigation

被引:116
作者
Cui, Zhen [1 ,2 ]
Luo, Yi [3 ]
Yu, Jin [3 ]
Xu, Yujing
机构
[1] Xian Univ Technol, Sch Automat & Informat Engn, Xian 710048, Peoples R China
[2] Shaanxi Civil Mil Integrat Key Lab Intelligence C, Xian 710048, Peoples R China
[3] Southeast Univ, Sch Mat Sci & Engn, Nanjing 211189, Jiangsu, Peoples R China
关键词
Molecular doping; MoSi2N4; Doping gap; Adsorption; Electric field; First principles; LARGE VALLEY POLARIZATION; HIGH CURIE-TEMPERATURE; MAGNETIC-PROPERTIES; MONOLAYER; GRAPHENE; STRAIN; POINT; MOS2;
D O I
10.1016/j.physe.2021.114873
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
MoSi2N4 is a recently developed 2D material that exhibits remarkable thermal, mechanical, electronic, and optical properties. We used first principles calculations to study the structural and electronic properties of organic molecule doped MoSi2N4 monolayers. Effective p-doping was achieved by molecular doping with tetracyanoquinodimethane and tetracyanoethylene, while n-doping was achieved by molecular doping with tetrathiafulvalene. The doping gap of tetrathiafulvalene-doped MoSi2N4 was successfully modulated by the application of an external electric field, which resulted in effective n-doping. Furthermore, molecular doping injects additional carriers into the host, which is beneficial for enhancing the performance of MoSi2N4 in nanoelectronic devices. Our results demonstrate the importance of molecular doping in tuning the electronic properties of MoSi2N4 and broadening its applications.
引用
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页数:7
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