In-plane interfacing effects of two-dimensional transition-metal dichalcogenide heterostructures

被引:53
|
作者
Wei, Wei [1 ]
Dai, Ying [1 ]
Huang, Baibiao [1 ]
机构
[1] Shandong Univ, Sch Phys, State Key Lab Crystal Mat, Jinan 250100, Peoples R China
基金
美国国家科学基金会;
关键词
ELECTRONIC-PROPERTIES; LATERAL HETEROJUNCTIONS; EPITAXIAL-GROWTH; MOS2; NANOSHEETS; SINGLE-LAYER; MONOLAYER; GRAPHENE; FIELD; INSIGHTS; ORIGIN;
D O I
10.1039/c6cp02741e
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In-plane heterostructures of two-dimensional transition-metal dichalcogenides (TMDs) demonstrate the formation of one-dimensional interfaces (or interlines), leading to new exciting properties and device functionalities. In this work, the interfacing effects have been studied in MoS2/WS2 quantum-well and superlattice in-plane heterostructures on the basis of first-principles electronic calculations. In light of the orbital-projected band structures, MoS2/WS2 in-plane heterostructures illustrate type-II band alignments with rather a small band offset for the valence band maximum and a relatively large band offset for the conduction band minimum. Upon increasing the width of TMD constituents, the band gap varies within a small range. In MoS2 and WS2, the surline energy and work function of zigzag edges with S-terminations are obviously higher than those of metal-terminations, and charge transfer from MoS2 to WS2 could be addressed due to the difference in the Fermi level. In-gap levels induced by S vacancies in MoS2/WS2 in-plane heterostructures are discrete and, interestingly, change to consecutive bands due to the built-in electric field.
引用
收藏
页码:15632 / 15638
页数:7
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