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Bipolaron mechanism for organic magnetoresistance
被引:405
|作者:
Bobbert, P. A.
Nguyen, T. D.
van Oost, F. W. A.
Koopmans, B.
Wohlgenannt, M.
机构:
[1] Tech Univ Eindhoven, Grp Polymer Phys, NL-5600 MB Eindhoven, Netherlands
[2] Tech Univ Eindhoven, Eindhoven Polymer Labs, NL-5600 MB Eindhoven, Netherlands
[3] Tech Univ Eindhoven, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
[4] Univ Iowa, Dept Phys & Astron, Iowa City, IA 52242 USA
[5] Univ Iowa, Opt Sci & Technol Ctr, Iowa City, IA 52242 USA
关键词:
D O I:
10.1103/PhysRevLett.99.216801
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
We present a mechanism for the recently discovered magnetoresistance in disordered pi-conjugated materials, based on hopping of polarons and bipolaron formation, in the presence of the random hyperfine fields of the hydrogen nuclei and an external magnetic field. Within a simple model we describe the magnetic field dependence of the bipolaron density. Monte Carlo simulations including on-site and longer-range Coulomb repulsion show how this leads to positive and negative magnetoresistance. Depending on the branching ratio between bipolaron formation or dissociation and hopping rates, two different line shapes in excellent agreement with experiment are obtained.
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