Schrodinger equation Monte Carlo in two dimensions for simulation of nanoscale metal-oxide-semiconductor field effect transistors

被引:11
作者
Chen, Wanqiang [1 ]
Register, Leonard F. [1 ]
Banerjee, Sanjay K. [1 ]
机构
[1] Univ Texas Austin, Microelect Res Ctr, Austin, TX 78758 USA
关键词
D O I
10.1063/1.2809403
中图分类号
O59 [应用物理学];
学科分类号
摘要
A quantum transport simulator, Schrodinger equation Monte Carlo in two dimensions (SEMC-2D), is presented that provides a rigorous yet reasonably computationally efficient quantum mechanical treatment of real scattering processes within quantum transport simulations of nanoscale metal-oxide-semiconductor field effect transistors (MOSFETs). This work represents an extension of an early version of SEMC for simulating quantum transport and scattering in quasi-one-dimensional device geometries such as encountered in conventional and quantum-cascade lasers. In many respects SEMC is simply a variation on nonequilibrium Green's function techniques, with scattering as well as carrier injection into the simulation region treated via Monte Carlo techniques. In this regard, SEMC also represents a quantum analog of semiclassical Monte Carlo. Scattering mechanisms considered include crystal momentum randomizing acoustic and optical intra- and intervalley scattering (and intra- and intersubband scattering), and nonrandomizing surface roughness scattering. Simulation results for nanoscale dual-gate MOSFET geometries are provided that illustrate the method and the continuing need for accurate modeling of scattering even in nanoscale MOSFETs. (c) 2008 American Institute of Physics.
引用
收藏
页数:15
相关论文
共 35 条
  • [1] CHEN W, 2002, J COMPUT ELECT, V1, P123
  • [2] Simulation of quantum effects along the channel of ultrascaled Si-based MOSFETs
    Chen, WQ
    Register, LF
    Banerjee, SK
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2002, 49 (04) : 652 - 657
  • [3] Quantum effects along the channel of ultra-scaled Si-based MOSFETs?
    Chen, WQ
    Ouyang, QQ
    Register, LF
    Banerjee, SK
    [J]. INTERNATIONAL ELECTRON DEVICES MEETING 2000, TECHNICAL DIGEST, 2000, : 291 - 294
  • [4] Nanoscale device modeling: the Green's function method
    Datta, S
    [J]. SUPERLATTICES AND MICROSTRUCTURES, 2000, 28 (04) : 253 - 278
  • [5] DATTA S, 1995, ELECT TRANSPORT MESO, P293
  • [6] Enhanced ballisticity in nano-MOSFETs along the ITRS roadmap: A Monte Carlo study
    Eminente, S
    Esseni, D
    Palestri, P
    Fiegna, C
    Selmi, L
    Sangiorgi, E
    [J]. IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2004, TECHNICAL DIGEST, 2004, : 609 - 612
  • [8] MC simulation of strained-Si MOSFET with full-band structure and quantum correction
    Fan, XF
    Wang, X
    Winstead, B
    Register, LF
    Ravaioli, U
    Banerjee, SK
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2004, 51 (06) : 962 - 970
  • [9] On the enhanced electron mobility in strained-silicon inversion layers
    Fischetti, MV
    Gámiz, F
    Hänsch, W
    [J]. JOURNAL OF APPLIED PHYSICS, 2002, 92 (12) : 7320 - 7324
  • [10] MONTE-CARLO STUDY OF ELECTRON-TRANSPORT IN SILICON INVERSION-LAYERS
    FISCHETTI, MV
    LAUX, SE
    [J]. PHYSICAL REVIEW B, 1993, 48 (04) : 2244 - 2274